高性能フォトニックチップ開発への道を切り拓く研究(PKU researchers pave the way toward high-performance photonic chips)

2026-04-16 北京大学(PKU)

北京大学の北京大学とAalto Universityの研究チーム(肖雲峰・孫志培ら)は、ファンデルワールス(vdW)材料を用いた高性能フォトニックチップ実現に向けた汎用ナノ加工技術を開発し、『Nature Materials』に発表した。従来課題であった低損失構造形成に対し、アルミニウムパッシベーションを併用した集束イオンビーム加工を確立し、多様なvdW材料やヘテロ構造に高精度加工を実現。これによりQ値10^6超の超高品質マイクロ共振器を作製し、光損失を大幅低減した。さらにGaSe微小共振器で高効率な連続波第二高調波発生(変換効率約30%/W)を達成し、従来比で4桁向上。和周波発生や光パラメトリック増幅も実証し、vdW材料が集積フォトニクスや量子デバイスに有望であることを示した。

高性能フォトニックチップ開発への道を切り拓く研究(PKU researchers pave the way toward high-performance photonic chips)
Figure 1. Conceptual illustration of an on-chip heterogeneous photonic circuit based on van der Waals materials and the corresponding general nanofabrication process.

<関連情報>

低損失非線形フォトニクス向け全ファンデルワールス型マイクロキャビティ All-van der Waals microcavities for low-loss nonlinear photonics

Zhi-Yan Wang,Xiaoqi Cui,Andreas C. Liapis,Hao-Ran Shao,Xu Cheng,Jingnan Yang,Nianze Shang,Weizhe Zhang,Henri Kaaripuro,Juan C. Arias Muñoz,Kaifeng Lin,Wenjing Liu,Kaihui Liu,Qihuang Gong,Zhipei Sun & Yun-Feng Xiao
Nature Materials  Published:13 April 2026
DOI:https://doi.org/10.1038/s41563-026-02574-x

Abstract

Van der Waals (vdW) materials have emerged as a promising platform for next-generation nanophotonics and optoelectronics. However, employing vdW materials as a core photonic integration platform, rather than as passive or active overlays on conventional silicon-based platforms, remains challenging, leaving their full potential untapped. Here we develop a nanofabrication strategy that enables high-resolution patterning across a broad range of vdW materials, including insulators, semiconductors, ferroelectrics and their heterostructures, and we show that they can be used as the intrinsic platform for low-loss microcavity nonlinear photonic devices such as microdisks, photonic crystals and metasurfaces. We demonstrate vdW microdisk resonators with quality (Q) factors exceeding 106. Such Q factors enable efficient continuous-wave nonlinear optical processes, including second-harmonic generation, sum-frequency generation and optical parametric amplification, with full free-spectral-range thermal tunability. These results position vdW materials as key material building blocks for next-generation integrated photonics and optoelectronics.

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