量子技術向け材料開発:レーザー技術で極限条件の薄膜合成を実現(Making Materials for Quantum Technologies: Laser Technique Unlocks Extreme Conditions for Thin Film Synthesis)

2026-04-15 カリフォルニア工科大学(Caltech)

Caltechの研究チームは、量子技術向け材料の開発に向け、極限環境を再現できる新たなレーザー技術を用いた薄膜合成手法を開発した。従来困難だった高温・高圧条件をレーザーで瞬間的に実現し、非平衡状態での材料形成を可能にした点が特徴である。この手法により、従来の方法では生成できなかった新規結晶構造や特異な電子特性を持つ材料の合成に成功した。特に量子デバイスに必要な精密な物性制御が可能となり、超伝導や量子情報処理への応用が期待される。また、この技術はスケーラブルで柔軟性が高く、次世代の機能性材料設計に新たな指針を提供する成果といえる。

量子技術向け材料開発:レーザー技術で極限条件の薄膜合成を実現(Making Materials for Quantum Technologies: Laser Technique Unlocks Extreme Conditions for Thin Film Synthesis)
A welding laser (yellow beam) heats a target, melting just a small central portion of a sample, generating enough vapor to condense and deposit on a substrate above. That substrate itself is heated by a laser above (red beam).Credit: David Catherall

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熱レーザー蒸着法により成膜された超薄型ニッケル膜の特性評価
Characterization of ultrathin nickel films deposited by thermal laser evaporation

David S. Catherall;Yifei Yan;Finley B. Donachie;Azmain A. Hossain;Austin J. Minnich
Applied Physics Letters  Published:February 24 2026
DOI:https://doi.org/10.1063/5.0309594

Thermal laser evaporation is a physical vapor deposition technique of increasing interest because of its ability to evaporate essentially any solid element, even the most refractory such as W. However, many films deposited by this method, especially non-epitaxial films, remain to be characterized; further, key system components such as the laser delivery system have not been described in detail. Here, we present the evaporation and characterization of ultrathin Ni films deposited with a home-built thermal laser evaporation system. The system employs a continuous-wave 1 kW fiber laser (1070 nm) focused to sub-millimeter diameter onto a Ni target rod mounted inside an ultrahigh-vacuum chamber. The laser heats the target to a temperature high enough to produce vapor for film deposition; for Ni, this temperature is around the melting point of 1728 K. We report the characterization of the surface roughness, composition, and room-temperature electrical properties of the films along with the design of the major components of our system. This work advances the growing consensus regarding the potential of thermal laser evaporation for thin film deposition and epitaxy and provides the necessary design information to facilitate broader adoption of the technique.

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