2026-04-27 関西学院大学
X線構造解析により求めたシリカガラスの中距離構造のサイズ（コヒーレンス長）や秩序 （周期的ゆらぎ）の変化。光加圧により，未処理のガラス構造は高圧処理後の構造に近づくが， 高圧処理後に光加圧すると，構造が元に戻るように変化する。（作成：下間靖彦）
＜関連情報＞
高圧および超短パルスレーザー励起による高密度シリカガラスの光学的特性制御 Tuning optical properties of densified silica glass via high pressure and ultrafast laser excitation
Misora Tsubone,Yasuhiko Shimotsuma,Yoshio Kono,Sho Kakizawa,Hiroki Yamada,Keita Kobayashi,Masahiro Shimizu & Kiyotaka Miura
NPG Asia Materials Published:27 April 2026
DOI:https://doi.org/10.1038/s41427-026-00649-4
Abstract
Silica glass exhibits diverse structural configurations accompanied by densification under varying temperature and pressure conditions; these factors significantly influence its optical properties, such as the refractive index. However, the fundamental structural mechanisms underlying the optical properties change induced by high-pressure/high-temperature (HPHT) and femtosecond laser direct writing (FLDW) remain incompletely resolved. Herein, we report the similarities and differences in the optical responses of densified silica glass induced by these two methods. The most significant difference is that the laser-irradiated region evolves toward a glass structure characteristic of a high-fictive temperature (1600–2000 K) by incorporating non-bridging oxygen defects associated with edge-sharing SiO4 tetrahedra, which induces distinctly different photoluminescence behaviors compared to high-pressure treatment. Our findings demonstrate the ability to locally tailor the glass structure to exhibit unique optical characteristics, thereby enabling the flexible design of optical communication systems and photoelectric fusion devices.
