カルコパイライト材料における欠陥工学により記録的熱電性能を達成(Record Thermoelectric Performance Achieved in Chalcopyrite Materials Through Defect Engineering)

2026-03-31 合肥物質科学研究院(HFIPS)

中国科学院合肥物質科学研究院・固体物理研究所のZHANG Jian教授らの研究チームは、カルコパイライト型熱電材料において欠陥工学を活用し、873 KでZT=2.03という高性能を達成した。Ag/In合金化により二重アンチサイト欠陥を導入し、結晶格子内で原子の位置交換を起こすことで、電気伝導と熱伝導の結合を緩和。これによりキャリア濃度と移動度、ゼーベック係数を維持しつつ、フォノン散乱を促進して熱伝導率を低減した。最適組成Cu0.7Ag0.3Ga0.6In0.4Te2は従来比約59%向上し、欠陥設計が熱電性能向上の有効手法であることを示した。

カルコパイライト材料における欠陥工学により記録的熱電性能を達成(Record Thermoelectric Performance Achieved in Chalcopyrite Materials Through Defect Engineering)
Charge-Neutral antisite defect pairs for decoupled electron-phonon Transport (Image by XU Ting)

<関連情報>

二重アンチサイト欠陥とドメイン構造が相乗的に作用し、カルコパイライト Cu 0.7 Ag 0.3 Ga 1– x In x Te 2 ( x = 0–0.5)で記録的な高 ZT > 2.0 を達成 Dual-Antisite Defects and Domain Structures Synergistically Boosting a Record-High ZT > 2.0 in Chalcopyrite Cu0.7Ag0.3Ga1–xInxTe2(x = 0–0.5)

Ting Xu,Wei Bai,Mi Qin,LuLu Huang,Yu Liu,Shenghui Wang,Zhou Li,Zhixiang Yuan,Hongxing Xin,Di Li,Zhulin Huang,Ping Chen,Xiaobing Liu,Yongsheng Zhang,Chong Xiao,Jian Zhang,and Yi Xie
Journal of the American chemical Society  Published: March 13, 2026
DOI:https://doi.org/10.1021/jacs.6c02266

Abstract

Antisite defects, as intrinsic point defects in crystals, have demonstrated significant potential in optimizing the thermoelectric performance of materials, particularly by modulating the carrier concentration. However, they typically degrade carrier mobility due to the strong coupling among thermoelectric parameters. To address this limitation, we propose a dual-antisite defects strategy: by introducing donor–acceptor defect pairs to form electrically neutral configurations, carrier scattering can be significantly reduced due to charge compensation. Meanwhile, the presence of these point defects still maintains strong phonon scattering. This approach minimizes the loss of electrical mobility while effectively suppressing lattice thermal conductivity (κL). Using chalcopyrite CuGaTe2 as a matrix, we incorporated charge-balanced dual-antisite defects (AgGa and InCu··) via alloying. This type of electrically neutral dual-antisite defects can maintain carrier mobility while increasing carrier concentration and significantly suppresses κL by enhancing phonon scattering through the interaction between alloy disorder scattering induced by In alloying and nanodomains. Remarkably, in Cu0.7Ag0.3Ga0.6In0.4Te2, a record-high ZT value of 2.03 at 873 K was achieved. This dual-antisite defects strategy provides a new paradigm for defect engineering in thermoelectric materials, enabling the simultaneous optimization of electrical and thermal transport properties and offering a valid pathway toward high-performance thermoelectrics.

1701物理及び化学
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