“エントロピー効果”により新規強誘電体窒化物を発見~低消費電力メモリや圧電センサ等への応用に期待~

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2025-06-23 東京科学大学

“エントロピー効果”により新規強誘電体窒化物を発見~低消費電力メモリや圧電センサ等への応用に期待~

理化学研究所と東京科学大学の研究チームは、AlNとGaNの合金にスカンジウム(Sc)を取り込むことで、新規な強誘電体窒化物膜を開発しました。エントロピー効果により従来より多くのScを結晶に取り込み、低電圧・低消費電力動作のメモリ材料を実現。AlNとGaNを混合することでScの含有率が向上し、圧電性や電気光学効果も増大。さらに、残留分極や抗電界の特性も明らかにし、超低消費電力メモリや6G対応デバイスへの応用が期待されます。

<関連情報>

(Al1-x-yGaxScy)N三元系ウルツ鉱薄膜の結晶構造と強誘電性に及ぼす薄膜組成の影響
Impact of film composition on crystal structure and ferroelectricity in (Al1−xyGaxScy)N ternary wurtzite thin films

Reika Ota;Nana Sun;Kazuki Okamoto;Shinnosuke Yasuoka;Yoshihiro Ueoka;Daiki Shono;Masami Mesuda;Hiroshi Funakubo
APL Materials  Published:April 22 2025
DOI:https://doi.org/10.1063/5.0261572

The wurtzite-structure ternary alloys of (Al,Ga,Sc)N films with a high Sc/(Al+Ga+Sc) ratio are successfully deposited by a reactive magnetron sputtering method. The breakthrough in ScN solid-solution limit in AlN with wurtzite structure [up to Sc/(Al + Ga + Sc) = 0.47] is achieved, and its wurtzite-phase diagram region is expanded by adding a relatively small amount of Ga [Ga/(Al+Ga+Sc) < 0.1] into the (Al,Sc)N film. The c– and a-axes lattice constants depend strongly on Ga/(Al+Ga+Sc) and Sc/(Al+Ga+Sc) ratios, respectively, and the Sc/(Al+Ga+Sc) ratio primarily determines the internal structure showing a crystal anisotropy parameter, u parameter. The dielectric constant increases with the increase of Sc/(Al+Ga+Sc) ratio. In addition, the coercive field significantly decreases from 5.8 to 1.8 MV/cm with an increasing Sc/(Al+Ga+Sc) ratio from 0.33 to 0.47, while polarization slightly reduces with the increased u parameter. This result provides a new way to expand the content of the ScN solid solution in the wurtzite film to further decrease the coercive field for the memory device applications.

0402電気応用
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