三次元マイクロ流路で半導体チップの省エネ水冷を実現~AI半導体の高性能化を支える高効率放熱技術~

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2025-04-14 東京大学

東京大学生産技術研究所の野村政宏教授らの研究チームは、AI半導体チップの高性能化と省エネルギー化を支える新たな高効率放熱技術を開発しました。この技術は、特殊な三次元マイクロ流路構造を持つ水冷システムを用いており、世界最高レベルの冷却効率と高い安定性を実現しています。これにより、AIチップや高出力電子機器の性能向上と省エネ化が可能となり、次世代電子機器の開発とカーボンニュートラルの実現への貢献が期待されます。

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マニホールド・キャピラリー構造によるチップ冷却により、二相システムで105 COPを実現 Chip cooling with manifold-capillary structures enables 105 COP in two-phase systems

Hongyuan Shi ∙ Simon Grall ∙ Ryoto Yanagisawa ∙ … ∙ Jean Louis Viovy ∙ Hirofumi Daiguji ∙ Masahiro Nomura
Cell Reports Physical Science  Published:April 7, 2025
DOI:https://doi.org/10.1016/j.xcrp.2025.102520

Graphical abstract

三次元マイクロ流路で半導体チップの省エネ水冷を実現~AI半導体の高性能化を支える高効率放熱技術~

Highlights

•Embedded two-phase cooling solution for electronic thermal management

•Manifold distribution layers efficiently reduce flow resistance compared to microchannels

•Capillary structure of micropillar enhances thin-film evaporation

•A chip cooling system with a coefficient of performance up to 105

Summary

The exploration of two-phase flow and heat transfer within confined spaces has revealed its potential to mitigate formidable heat dissipation in various applications, such as thermal management in advanced electronic devices. However, the inherent, remarkable disparity between the specific volume of two phases, coupled with size effects on liquid/vapor interactions, occasionally results in uncontrolled multiphase flow, increased pressure drop, and reduced critical heat flux. Here, we present an innovative cooling solution using a microchannel heat sink with micropillars as the capillary structure to enhance thin-film evaporation, thus controlling the chaotic two-phase flow to some extent and mitigating local dry-out issues, along with three-dimensional (3D) manifold fluidic passages for efficient distribution of coolant into the microchannels. We demonstrate a significant increase in the coefficient of performance, reaching up to 105. Our approach not only sets a new benchmark for cooling efficiency but also opens pathways for thermal management in next-generation, high-performance electronic systems.

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