ダイヤモンドで原子スケールの精度を達成する新しいレーザー技術 (New laser technique achieves atomic-scale precision on diamonds)

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2024-12-02 オーストラリア連邦・マッコーリー大学

マッコーリー大学の研究チームは、深紫外(UV)レーザーを用いて、ダイヤモンド表面の原子層を精密に加工する技術を開発しました。この手法により、標準的な大気環境下で、単一原子層の1%に相当する極微小な部分の除去が可能となり、従来の大規模な真空装置を必要としない高精度な表面制御が実現しました。特に、レーザー処理後のダイヤモンド表面の導電性が最大で7倍に向上することが確認され、半導体や量子デバイス、先端製造分野での応用が期待されています。

<関連情報>

サブ単層レーザーエッチングが(100)ダイヤモンド表面の化学的および電気的特性に及ぼす影響 The effects of sub-monolayer laser etching on the chemical and electrical properties of the (100) diamond surface

Mojtaba Moshkani,Michael W. Geis,James E. Downes,Richard P. Mildren
Applied Surface Science  Available online: 20 November 2024
DOI:https://doi.org/10.1016/j.apsusc.2024.161816

Graphical abstract

ダイヤモンドで原子スケールの精度を達成する新しいレーザー技術 (New laser technique achieves atomic-scale precision on diamonds)

Highlights

  • Sub-monolayer etch doses of UV alter the top layer chemistry and surface electrical properties.
  • UV laser doses increase the surface conductivity by 5-7 times.
  • The UV effect may include rearrangement of the surface to align step edges or make in more {111}-like.

Abstract

Tailoring the surface chemistry of diamond is critical to a range of applications from quantum science to electronics. It has been recently shown that dosing the diamond surface with pulsed UV light at fluences below the ablation threshold provides a practical method for precision etching of the surface. Here, we track the evolution of the surface chemistry and its electrical properties as a function of dose using x-ray surface analysis, Hall and resistance measurements. It is found that the surface properties evolve rapidly, even for doses that correspond to removal of less than 5% of the top carbon monolayer and fluences less than 1 J/cm<?XML:NAMESPACE PREFIX = “[default] http://www.w3.org/1998/Math/MathML” NS = “http://www.w3.org/1998/Math/MathML” />2. As well altering XPS-measured surface populations, sub-monolayer etch doses lower the valence band by up to 0.2 eV, and produce a permanent increase in the conductivity of the hydrogen terminated surface by up to 7 times. Similar enhancements in conductivity are obtained for doses that remove up to 1600 ML. The results provide guidance for manipulating diamond surface chemistry by UV laser etching and introduce a promising method for enhancing the performance of diamond devices such as field-effect transistors.

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