高エントロピー酸化物で低抵抗・高性能TMR素子を実現〜大容量磁気ストレージでスマート社会を支える新材料〜

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2025-07-09 物質・材料研究機構

NIMSは、高エントロピー酸化物「LiTiMgAlGaO」をTMR素子のバリア層に用い、強い垂直磁化、高TMR比(80%超)、低電気抵抗の同時実現に成功した。従来のMgOバリアに比べてバリア高さが半分以下で、トンネル電流が増加し、素子全体の電気抵抗が大幅に低減。次世代MRAMやHDDの高速・大容量化に貢献する新材料として注目される。今後は組成最適化や機械学習を用いた設計加速により、さらなる性能向上と実用化を目指す。

高エントロピー酸化物で低抵抗・高性能TMR素子を実現〜大容量磁気ストレージでスマート社会を支える新材料〜
図: (a) 均一な元素分布を示すLiTiMgAlGaOバリア層の断面構造。 (b) バリア層により磁性層に強い垂直磁気異方性を付与。

<関連情報>

スピントロニクス応用に向けた界面垂直磁気異方性とトンネル磁気抵抗効果を有する高エントロピー酸化物エピタキシャル薄膜 High entropy oxide epitaxial films with interface perpendicular magnetic anisotropy and tunnel magnetoresistance effect toward spintronic applications

Rombang Rizky Sihombing, Thomas Scheike, Jun Uzuhashi, Hideyuki Yasufuku, Tadakatsu Ohkubo, Zhenchao Wen, Seiji Mitani, Hiroaki Sukegawa
Materials Today  Available online: 5 July 2025
DOI:https://doi.org/10.1016/j.mattod.2025.06.025

Abstract

High entropy materials, usually composed of five or more constituent elements with a high mixing entropy have attracted increasing attention due to the marked development of new phases of multicomponent structural and functional materials. In particular, high entropy oxides (HEOs) are expected to realize their potential for electronic functionalities in spintronics, since the oxygen lattice required for achieving the functionalities remains besides the cation site disorder. In this study, we explored the HEO thin films with a rock-salt-like structure of LiTiMgAlGaO (L5O) for perpendicular magnetic anisotropy (PMA), which is induced at an interface with the CoFeB ferromagnet. The atomically homogeneous cation distributions in the 10–20 nm thick L5O films were achieved by atomic sputtering lamination on a MgO(001) single crystal substrate. The films were grown with a highly (001)-oriented epitaxial growth and have an atomically flat surface with an average roughness of 0.07 nm. We observed perpendicular magnetization of CoFeB on the L5O layer after 250–350 °C post-annealing, revealing that introduction of significantly large PMA at HEO/ferromagnet interfaces. A large interface PMA energy of up to ∼ 0.8 erg/cm2 at the interface was observed due to the achievement of structurally stable epitaxial layers with high crystallinity and sharp interfacial flatness of L5O and CoFeB interfaces. We also demonstrated that a tunnel magnetoresistance (TMR) ratio of up to 84 % at room temperature in epitaxial Fe/L5O/Fe(001) magnetic tunnel junctions (MTJs) with ultrathin MgO insertions at the L5O interfaces, indicating that the spin-dependent coherent tunneling mechanism is also observed in HEO-based MTJs. In addition, the L5O barrier exhibits low barrier heights less than 1 eV due to the bandgap reduction caused by the five cations. Our results of the high interface PMA energy, the relatively large TMR ratio, and the low barrier height show that the HEO materials can be a promising material family of ultra-thin barriers of MTJs for the next generation of spintronic devices such as ultra-high-density memory and spin artificial intelligence devices.

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